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FDL 2011
Forum on specification & Design Languages

September 13-15, 2011
Oldenburg, Germany

Download the FDL 2011 conference program in PDF

Forum for Design Languages (FDL) is a well established international forum devoted to dissemination of research results, practical experiences and new ideas in the application of specification, design and verification languages to the design, modelling and verification of integrated circuits, complex hardware/software embedded systems, and mixed-technology systems. Modelling and specification concepts push the development of new design and verification methodologies to system level thus providing a means for model-driven design of complex information processing systems in a variety of application domains. One of the principal advantages of FDL is that it brings together four related thematic areas and gives an opportunity to gain up-to-date knowledge in many broad areas of the fast evolving field of system design and verification.

FDL 2011 will be held in Oldenburg, Germany, from 13 to 15 September 2011 and will be the fourteenth FDL conference following a series of highly successful events that took place in Lausanne, Lyon, Tübingen, Marseille, Frankfurt am Main, Lille, Darmstadt, Barcelona, Stuttgart, Sophia Antipolis, and Southampton. FDL is organized in technical cooperation with the the IEEE. FDL papers will be available online via IEEEXplore after the conference.

The  OFFIS  Institute  for  Information  Technology,  founded  in  1991,  is  an application-oriented  non-profit  research  and  development  institute  with close links to  the  Computer Science  department  of  the  University  of  Oldenburg  in  Lower  Saxony,  north-western Germany.  Its  primary  mission  is  to  adopt  the  findings  from  university  basic  research  in computer science and other relevant disciplines, to stay in touch with new market demands through its many years of experience in co-operation projects with the industry, and to bridge the  gap  between  “basic  research”  and  “application  demands”  through  application-oriented research. OFFIS staff currently counts about 250 employees. More than 150 scientists (in their vast majority computer scientists, but also  engineers,  economists,  physicists  and  from  other  disciplines  as  well)  work in interdisciplinary  teams.  OFFIS  focuses  its  R&D  activities  in  three  challenging  application areas: Energy, Health, and Transportation.

FDL 2011 is organized with the technical co-sponsorship of
IEEE and the IEEE Council on Electronic Design Automation (CEDA)


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